ANNOUNCEMENT .VELDHOVEN，THE NETHERLANDS，JANUARY 12 0 2 4

A license for the shipment of NXT:2050i and NXT:2100ilithography systems in 2023 hasrecently been partially revoked by the Dutch government, impacting a small number ofcustomers in China

We do not expect the current revocation of our export license or the latest U.S. export controlrestrictions to have a material impact on our financial outlook for 2023

In recent discussions with the US government,ASML has obtained further clarification of thescope and impact of the US export control regulations. The latest US export rules (publishedOctober 17,2023)impose restrictions on certain mid critical DUV immersion lithographysystems for a limited number of advanced production facilities.

ASML is fully committed to comply with all applicable laws and regulations including exportcontrol legislation in the countries in which we operate.

TWINSCAN NXT:2050i

通過將高生產率與前所未有的覆蓋性能相結合，該系統滿足了多種圖案化要求，為在先進邏輯和 DRAM 節點制造 300 毫米晶圓提供了經濟高效的解決方案。

TWINSCAN NXT:2100i

TWINSCAN NXT:2100i 是TWINSCAN NXT:2050i的后繼產品。其新的硬件和軟件創新使單機覆蓋率提高了 10% (0.9 nm)，匹配機覆蓋率提高了 13% (1.3 nm)。

NXT:2100i 采用了新的鏡頭畸變操縱器 ，為芯片制造商提供了前所未有的校正能力。它使系統能夠改善 DUV-EUV 交叉匹配疊加。通過將 4 色測量增加到 12 色以及在晶圓測量側添加更多對準標記測量，可以提高對準精度。各種軟件算法也已更新，以提供改進的場間和場內疊加控制。

ASML聲明如下：